The invention relates to a method of synthesis of pure materials by laser ablation, in direct flux, from multiple non-parallel targets, intended to be used in electronic industry for thin film deposition and for the synthesis of nanometric materials. According to the invention, the method comprises the simultaneous laser ablation of a plurality of non-parallel targets, the confining of the ablation plasmas in a direction which differs from the initial direction and passing the resulting ablation plasma or the precursors thereof through an adjustable aperture(s) trap.